PRODUCT AND APPLICATIONS
Si Epitaxial Products
Products and Applications
PRODUCT USE
On epitaxial wafers
Silicon epitaxial wafers grow one or more layers of silicon single crystal films on polished silicon single crystal wafers by vapor phase chemical reaction at high temperature. Epitaxial layers with different resistivity, thickness and types can be obtained by controlling growth conditions. It is an important basic material for manufacturing various silicon integrated circuits and discrete devices.
Epitaxial wafer applications
▶Discrete(Bipolar,Schottky,Power MOS,lGBT,FRD
▶CMS lC
▶bipolar lC
Product parameters
Epitaxial doping value: p-type boron; N-type phosphorus
Epitaxial size: 4-12 inch
Epitaxial layer thickness: 0.5-150 um
Epitaxial layer resistivity: 0.02-1000 ohm cm
Orientation: (100), (111)
Application of semiconductor devices
In this era of highly developed information technology, mobile phones, computers, televisions, solar cells can be seen everywhere. The operation of these electrical appliances is inseparable from integrated circuits. Therefore, as the base material of integrated circuit, silicon wafer is very important for the development of information industry.
